J-ZM1 Industrial Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced Metallurgical microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
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Specification |
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Viewing Head |
Compensation Free Trinocular Head, Inclined 30°（50mm-75mm） |
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Eyepiece |
WF10×/25mm |
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WF10×/20mm,crosshair with reticule0.1mm |
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Objective |
Long working distance bright and dark field Infinite Plan objectives: 5×/0.1B.D/W.D.29.4mm10×/0.25B.D/W.D.16mm20×/0.40B.D/W.D.10.6mm40×/0.60B.D/W.D.5.4mm |
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Nosepiece |
Quintuple Nosepiece with DIC Jack |
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Stage |
Double layer mechanical stage |
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Stage Size:190mm×140mm |
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Moving Range:50mm×40mm |
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Filter |
Flashboard type filters (green, blue, neutral ) |
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Focusing |
Coaxial coarse ＆fine focusing adjustment With rack and pinion mechanism Fine focusing scale value0.002mm |
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Light Source |
With aperture iris diaphragm and field iris diaphragm, halogen Bulb 12V/50W, AC85V-230 Brightness Adjustable |
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Polarizing Device |
Analyzer rotatable 360,°Polarizer＆Analyzer can be moved in/out of the optical path |
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Checking Tool |
0.01mm Micrometer |
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Optional Accessory |
Two-dimensional measurement software |
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Professional metallurgical image analysis software |
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Halogen Bulb 12V/100W |
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Micrometer eyepiece |
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1.3Mega、2.0 Mega、3.0 Mega,5.0 Mega pixels CMOS Digital camera eyepieces |
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Long working distance bright ＆ dark field Infinite Plan objectives: 50×/0.55B.D/W.D.5.1mm、 80×/0.75B.D/W.D.4mm、100×/0.80B.D/W.D.3mm |
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Precision Stage: X-Y moving range25mm×25mm,Moving Precision＜5um,Digital hand wheel Min.Value:0.1um,360°Rotatable disc |
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Photography attachment and CCD Adapter 0.5×、0.57×、0.75× |
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DIC（10×、20×、40×、100×） |
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Planishing tool |
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CCD Camera, color 1/3″High resolution 520 TV lines |
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Characteristics and description
1. UIS infinite-optical system.
2. Adopt long-life halogen light source with much higher light efficiency.
3. Bright and dark field, Polarization and differential interference function.
4. The aspherical Kohler illumination, increasing the brightness of observation.
5. WF10 ×（Φ25）Super wide viewing field Eyepiece, long working distance metallurgical objective with bright and dark field
6. The Quintuple Nosepiece can be equipped with detachable DIC differential interference device.
DIC: Nomarski differential interference contrast observation is deemed to the essential means to checkout the materials, semiconductor and metal structure now.