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J-M158 Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, Used as an advanced Metallurgical microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds. This instrument adopts both reflecting and transmitted illumination, BrightDark field, DIC and Polarizing observation can proceed under reflecting illumination, and the Bright field observation is done under transmitted light. High quality and reliable optical system brings much clearer and sharper image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

Specification

Viewing Head

Compensation Free Trinocular Head, Inclined 30°50mm-75mm

Eyepiece

WF10×/25mm

WF10×/20mm,crosshair with reticule0.1mm

Objective

Long working distance brightdark field Infinity Plan Objectives:

5×/0.1B.D/W.D.29.4mm10×/0.25B.D/W.D.16mm

20×/0.40B.D/W.D.10.6mm40×/0.60B.D/W.D.5.4mm

Nosepiece

With DIC Jack Quadruple Nosepiece

Stage

Double layer mechanical stage

Stage Size:189mm×160mm

Moving Range:80mm×50mm

Filter

Flashboard type Filters (green, blue, neutral)

Condenser

N.A.1.25Abbe Condenser with iris diaphragm and filter

Focusing

Coaxial coarse fine focusing adjustment with rack and pinion mechanism. Fine focusing scale value0.002mm

Light Source

Transmission Illumination: Halogen Bulb 12V/50W,AC85V-230V, Brightness Adjustable

Epi-illumination: With aperture iris diaphragm and field iris diaphragm, halogen Bulb 12V/50W,AC85V-230V, Brightness Adjustable

Polarizing Device

Analyzer 360°rotatable,both Polarizer and Analyzer can be moved out of the light path

Checking Tool

0.01mm Micrometer

Optional Accessory

Two-dimensional measure software

Professional metallurgical image analysis software

Epi-illumination: Halogen Bulb 12V/100W,AC85V-230V, Brightness Adjustable

Long working distance bright dark field Infinite Plan objectives: 50×/0.55B.D/W.D.5.1mm80×/0.75B.D/W.D.4mm100×/0.80B.D/W.D.3mm

micrometer eyepiece

1.3Mega2.0 Mega3.0 Mega,5.0 Mega pixels CMOS Digital camera eyepieces

Photography attachment and CCD Adapter 0.5×0.57×0.75×

DIC10×20×40×100×

Planishing tool

CCD Camera, color 1/3″High resolution 520 TV lines

Characteristics and description

1. Adopt UIS High-resolution, long working distance, and infinity light path correcting system objective imaging technology

2. Extending the multiplexing technology of objective, compatible infinity objective with all the observation methods, including brightdark field observation, polarization and DIC also provide with high clear and sharp image in each observation method.

3. Aspherical surface Kohler illumination, increasing the viewing brightness.

4. WF10×Φ25Super wide viewing field Eyepiece, long working distance metallurgical objective with bright and dark field

5. The Nosepiece can be equipped with detachable DIC differential interference device.